JPS61209449A - 非反射性ペリクル体 - Google Patents

非反射性ペリクル体

Info

Publication number
JPS61209449A
JPS61209449A JP60049247A JP4924785A JPS61209449A JP S61209449 A JPS61209449 A JP S61209449A JP 60049247 A JP60049247 A JP 60049247A JP 4924785 A JP4924785 A JP 4924785A JP S61209449 A JPS61209449 A JP S61209449A
Authority
JP
Japan
Prior art keywords
refractive index
light
film
polymer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60049247A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6325658B2 (en]
Inventor
Tsumoru Kuwabara
桑原　積
Yasunori Fukumitsu
福光　保典
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP60049247A priority Critical patent/JPS61209449A/ja
Publication of JPS61209449A publication Critical patent/JPS61209449A/ja
Publication of JPS6325658B2 publication Critical patent/JPS6325658B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laminated Bodies (AREA)
JP60049247A 1985-03-14 1985-03-14 非反射性ペリクル体 Granted JPS61209449A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60049247A JPS61209449A (ja) 1985-03-14 1985-03-14 非反射性ペリクル体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60049247A JPS61209449A (ja) 1985-03-14 1985-03-14 非反射性ペリクル体

Publications (2)

Publication Number Publication Date
JPS61209449A true JPS61209449A (ja) 1986-09-17
JPS6325658B2 JPS6325658B2 (en]) 1988-05-26

Family

ID=12825521

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60049247A Granted JPS61209449A (ja) 1985-03-14 1985-03-14 非反射性ペリクル体

Country Status (1)

Country Link
JP (1) JPS61209449A (en])

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63138352A (ja) * 1986-11-29 1988-06-10 Dainippon Printing Co Ltd ペリクル用高分子薄膜
JPS6448062A (en) * 1987-08-18 1989-02-22 Mitsui Petrochemical Ind Dustproof film
JPH02158734A (ja) * 1988-12-13 1990-06-19 Mitsui Petrochem Ind Ltd 高光線透過性防塵体の製造方法
JPH03170901A (ja) * 1989-09-06 1991-07-24 E I Du Pont De Nemours & Co 反射防止薄膜
US5168001A (en) * 1991-05-20 1992-12-01 E. I. Du Pont De Nemours And Company Perfluoropolymer coated pellicle
US5246767A (en) * 1988-12-13 1993-09-21 Mitsui Petrochemical Industries, Ltd. High light-transmissive dust-proof body and method of preparing same
US6342292B1 (en) 1997-12-16 2002-01-29 Asahi Kasei Kabushiki Kaisha Organic thin film and process for producing the same
US6926952B1 (en) 1998-01-13 2005-08-09 3M Innovative Properties Company Anti-reflective polymer constructions and method for producing same
JP2008191656A (ja) * 2007-01-31 2008-08-21 Internatl Business Mach Corp <Ibm> ペリクル、方法（ｎａが１より大きい液浸リソグラフィ・システム用に最適化されたペリクル被膜）

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0235849U (en]) * 1988-09-01 1990-03-08
JPH02125469U (en]) * 1989-03-27 1990-10-16

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5546301A (en) * 1978-09-22 1980-04-01 Sandosutoroomu Pooru Toy gun
JPS58196501A (ja) * 1981-12-02 1983-11-16 アドバンスド　セミコンダクタ　プロダクツ 光学的薄膜体の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5546301A (en) * 1978-09-22 1980-04-01 Sandosutoroomu Pooru Toy gun
JPS58196501A (ja) * 1981-12-02 1983-11-16 アドバンスド　セミコンダクタ　プロダクツ 光学的薄膜体の製造方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63138352A (ja) * 1986-11-29 1988-06-10 Dainippon Printing Co Ltd ペリクル用高分子薄膜
JPS6448062A (en) * 1987-08-18 1989-02-22 Mitsui Petrochemical Ind Dustproof film
JPH02158734A (ja) * 1988-12-13 1990-06-19 Mitsui Petrochem Ind Ltd 高光線透過性防塵体の製造方法
US5246767A (en) * 1988-12-13 1993-09-21 Mitsui Petrochemical Industries, Ltd. High light-transmissive dust-proof body and method of preparing same
JPH03170901A (ja) * 1989-09-06 1991-07-24 E I Du Pont De Nemours & Co 反射防止薄膜
US5168001A (en) * 1991-05-20 1992-12-01 E. I. Du Pont De Nemours And Company Perfluoropolymer coated pellicle
US6342292B1 (en) 1997-12-16 2002-01-29 Asahi Kasei Kabushiki Kaisha Organic thin film and process for producing the same
US6797207B2 (en) 1997-12-16 2004-09-28 Asahi Kasei Emd Corporation Process for producing organic thin film
US6926952B1 (en) 1998-01-13 2005-08-09 3M Innovative Properties Company Anti-reflective polymer constructions and method for producing same
JP2008191656A (ja) * 2007-01-31 2008-08-21 Internatl Business Mach Corp <Ibm> ペリクル、方法（ｎａが１より大きい液浸リソグラフィ・システム用に最適化されたペリクル被膜）

Also Published As

Publication number Publication date
JPS6325658B2 (en]) 1988-05-26

Similar Documents

Publication Publication Date Title
US5061024A (en) Amorphous fluoropolymer pellicle films
WO1988004070A1 (en) Dust cover with excellent light transmittance for photomask reticle
US5168001A (en) Perfluoropolymer coated pellicle
JPS61209449A (ja) 非反射性ペリクル体
JP6923998B2 (ja) 光学部材およびその製造方法
KR0151386B1 (ko) 고투광성 방진체 및 그의 제조방법
US7416820B2 (en) Pellicle film optimized for immersion lithography systems with NA&gt;1
US6586159B2 (en) Method for using a coated fluoropolymer substrate pellicle in semiconductor fabrication
JP2817884B2 (ja) 反射防止薄膜
JPS6322576B2 (en])
US20090042107A1 (en) Pellicle for high numerical aperture exposure device
JP3221770B2 (ja) プラスチック光学部品の反射防止膜
KR102292648B1 (ko) 반사 방지 필름 및 이를 포함한 광학소자
JP3490214B2 (ja) 反射防止フィルム
JP3302268B2 (ja) ペリクルの製造方法
JPS6153601A (ja) 高性能なフオトマスク・レチクル用防塵カバ−体
JP3088783B2 (ja) 高透過性ペリクル
JP2790850B2 (ja) ペリクル用セルロース薄膜
JPH01100549A (ja) ペリクル膜
JP2005308469A (ja) 多層膜反射鏡及びｅｕｖ露光装置
JPH02158735A (ja) 高光線透過性防塵体
CN117572543A (zh) 一种针对远红外大面积超构透镜、增透膜设计及加工方法
JPH0481756A (ja) 耐光性に優れたペリクル
JP2001141904A (ja) 多層反射防止膜
JPH0470750A (ja) 防塵体の製造方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees